| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of an ultraviolet ray radiation resistant synthetic quartz glass having a predetermined hydroxy group content and a low chlorine content. SOLUTION: The manufacture of the synthetic quartz glass having the predetermined hydroxy group content includes (a) a step of forming a porous SiO<SB>2</SB>soot material by a flame hydrolysis reaction or oxidation of a silicon-containing starting compound and lamellar deposition of SiO<SB>2</SB>particle on a rotary supporting body and (b) a step of dehydrating the soot material at drying temperature in a reaction gas-containing dry atmosphere to remove the hydroxy group and (c) a step of forming the synthetic quartz glass by vitrifying the SiO<SB>2</SB>soot material, and the dehydrating treatment by the step (b) includes a drying stage using ozone as a reaction gas, and an ozone content in the dry atmosphere at that time is 0.5-10 vol.%, and the drying temperature is selected in a range of 1,200-1,300°C, which results in that halogen is not supplied the dry atmosphere. COPYRIGHT: (C)2008,JPO&INPIT
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