| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition and a method of pattern formation with the same, and to provide a positive resist composition improved in various performances such as pattern profile, pattern collapse and scumming and excellent also in backward contact angle of an immersion liquid and water follow-up properties, and also to provide a method of pattern formation. <P>SOLUTION: The positive resist composition comprises: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid. The method of pattern formation with the composition is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
