| 摘要 |
<p>A lithographic apparatus and a device manufacturing method are provided to improve accuracy by using a clamping system for clamping a substrate and a substrate table and clamping the substrate table and a supporting structure. A lithographic apparatus is disposed to transfer a pattern from a patterning device onto a substrate(W). The lithographic apparatus includes a supporting body(MT), a substrate table(WT), a first clamping system, and a second clamping system. The supporting body is formed to hold the patterning device. The patterning device is used for providing a pattern to be transferred onto the substrate. The substrate table is formed to hold the substrate. The first clamping system is formed to clamp the substrate table to a substrate table supporting structure. The second clamping system is formed to clamp the substrate to the substrate table after the substrate table is clamped to the substrate table supporting structure.</p> |
