APPARATUS FOR SUPPORTING SUBSTRATE AND METHOD FOR PREVENTING DEFOCUS

摘要

A substrate supporting apparatus and a defocus preventing method using the same are provided to increase productivity by suppressing basically a defocus caused by particles on a rear surface of a substrate. A substrate chuck(100) includes a plurality of small-sized substrate chucks(110) having a vacuum hole(111) in order to absorb a semiconductor substrate by using vacuum through the vacuum hole. A small-sized substrate chuck driving unit(500) moves the small-sized substrate chucks. A vacuum generation unit(300) applies the vacuum through the vacuum hole. A particle detection sensor(200) is formed to sense particles from a rear surface of the semiconductor substrate. A control unit(400) transmits a control signal to the small-sized substrate chuck driving unit in order to move downwardly the small-sized substrate chuck having the particles when the particle detection sensor senses the particles.