发明名称 RADIATION-SENSITIVE NEGATIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a process by which thick platings such as bumps and wirings are produced with high precision while a resist shows high swelling resistance to a plating solution and the plating solution is prevented from leaking in between the pattern and substrate, a radiation-sensitive negative resin composition which shows sensitivity suitable for the production process and possesses excellent resolution and heat resistance, and a transfer film including the composition. <P>SOLUTION: The radiation-sensitive negative resin composition contains (A) a polymer including a structural unit represented by formula (1) and a structural unit represented by formula (2); (B) a compound having one ethylenically unsaturated double bond; and (C) a radiation-sensitive radical polymerization initiator. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007293306(A) 申请公布日期 2007.11.08
申请号 JP20070081862 申请日期 2007.03.27
申请人 JSR CORP 发明人 ONIMARU NAMI;SAKAI YOKO
分类号 G03F7/033;G03F7/004;G03F7/031;H05K3/18 主分类号 G03F7/033
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