| 摘要 |
PROBLEM TO BE SOLVED: To form an insulating separation structure by a simple manufacturing process. SOLUTION: A groove structure is formed by forming the groove arriving at an insulating layer 12 on an active layer 13, an oxidized film is formed by performing thermal oxidation treatment of the surface of the active layer 13, a thin film is formed on the surface of the oxidized film, the oxidized film of an area except the upper part of the groove structure and the thin film are removed, and the insulating separation structure is formed by removing a support layer 11 and the insulating layer 12 of the area of the lower part of the groove structure. COPYRIGHT: (C)2008,JPO&INPIT
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