| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device that further surely prevents the main faces of a substrate from being contaminated with foreign matter when cleaning the substrate, and to provide a substrate cleaning method. SOLUTION: The cleaning device is at least used for scrub-cleaning of the end faces of a substrate to be cleaned. The cleaning device is at least provided with cleaners which perform the scrub-cleaning of the end faces of the substrate to be cleaned with a cleaning fluid supplied from cleaning fluid supply nozzles, rinsing fluid supply nozzles for supplying a rinsing fluid onto the main faces of the substrate to be cleaned, and splash shielding members respectively arranged between each rinsing fluid supply nozzle and each cleaner. The splash shielding members and rinsing fluid supply nozzles are arranged on both main face sides of the substrate to be cleaned. The splash shielding members prevent splashes of the cleaning fluid from being scattered from each cleaner to the main faces of the substrate to be cleaned. The rinsing fluid supply nozzles supply the rinsing fluid from each main face to the end face direction of the substrate to be cleaned, so as to prevent the cleaning fluid from advancing from the end face direction to the main face direction of the substrate to be cleaned. COPYRIGHT: (C)2008,JPO&INPIT
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