| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming an exposure object to be used for proximity exposure which can execute uniform exposure over an entire mask and form a highly definite micro-pattern, and to provide a proximity exposure method and a method of manufacturing an element using the proximity exposure method. <P>SOLUTION: The method of forming the exposure object is used for proximity exposure in which a light shielding film having micropores smaller than the wavelength size of an exposure light is closely attached, and a light is emitted from an exposure light source to transfer a pattern. The method has a step of forming a profile buffering layer 202 on a substrate 201 having unevenness so as to bury the unevenness of the substrate and planarizing the substrate surface, a step of forming a light reflecting layer 203 reflecting the exposure light on the profile buffer layer, and a step of forming a photosensitive resist layer 204 on the light reflecting layer. <P>COPYRIGHT: (C)2008,JPO&INPIT |
