发明名称 |
APPARATUS AND METHOD FOR INSPECTING MASK FOR USE IN FABRICATING AN INTEGRATED CIRCUIT DEVICE |
摘要 |
In an embodiment, a mask inspection apparatus for detecting defects in a semiconductor pattern on a mask includes optics for combining light transmitted through or reflected from the mask with a reference beam. The two light beams are transmitted through a second-order non-linear optical system. Mask defects affect the transmitted/reflected light and may be detected by analyzing the transmitted light intensity. The second-order non-linear optical system amplifies selected elements of the combined beam, thus improving detection.
|
申请公布号 |
US2007258635(A1) |
申请公布日期 |
2007.11.08 |
申请号 |
US20070745905 |
申请日期 |
2007.05.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM DO-YOUNG;CHUNG DONG-HOON |
分类号 |
G06K9/00;G01B11/24;G03F1/84;H01L21/027 |
主分类号 |
G06K9/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|