WET PROCESS APPARATUS

摘要

A wet process apparatus is provided to prevent noises and scratches from being formed by transferring a substrate using a non-contact scheme. A wet process apparatus includes a transfer unit and a liquid supply unit(2). The transfer unit transfers a substrate in one direction. The liquid supply unit supplies a liquid to the substrate. The transfer unit includes a jig(6), a first magnetic material(8), and a rail unit(11). The jig supports the substrate. The first magnetic material is coupled with one surface of the jig. The rail unit is formed in a transfer direction on the substrate. A magnetic pole corresponding to a magnetic pole of the first magnetic material is formed on the rail unit, which faces the first magnetic material. The liquid supply unit includes a spray unit for spraying the liquid on the substrate.