发明名称 SUCTION PAD AND SUBSTRATE TREATMENT APPARATUS
摘要 A suction pad used for use in a substrate treatment apparatus which treats a substrate by immersing the substrate in a solution while the pad attaches to the substrate, including: a main face for attaching to the substrate; an outer face disposed along the outer periphery of the substrate; and a suction opening formed in the main face. In a cross-sectional shape including the main face and the outer face, the angle formed between a line corresponding to the main face and a line corresponding to the outer face is an acute angle.
申请公布号 US2007251817(A1) 申请公布日期 2007.11.01
申请号 US20070693859 申请日期 2007.03.30
申请人 CANON KABUSHIKI KAISHA 发明人 KIDO SHIGERU
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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