<p>A process for producing continuous polishing pads which is reduced in the number of production steps and has excellent productivity. Also provided is a process for producing continuous layered polishing pads which is reduced in the number of production steps, has excellent productivity, and prevents the pads from suffering polishing layer/cushioning layer separation. The process for producing continuous polishing pads comprises: a step in which a urethane composition having bubbles dispersed therein is prepared by mechanical foaming; a step in which a face material is delivered and the urethane composition having dispersed bubbles is continuously ejected onto the material; a step in which another face material is superposed on the urethane composition having dispersed bubbles; a step in which the urethane composition having dispersed bubbles is cured while regulating the thickness so as to be even to thereby form a polishing layer made of a polyurethane foam; a step in which the polishing layer is cut into two slices in a direction parallel with the plane to thereby simultaneously produce two continuous polishing layers each comprising of a polishing layer and a face material; and a step in which the resultant continuous polishing layers are cut.</p>
