发明名称 |
HIGH CONTACT ANGLE TOPCOAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESS |
摘要 |
A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.
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申请公布号 |
US2007254236(A1) |
申请公布日期 |
2007.11.01 |
申请号 |
US20060380744 |
申请日期 |
2006.04.28 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALLEN ROBERT D.;BROCK PHILLIP J.;LARSON CARL E.;SOORIYAKUMARAN RATNAM;SUNDBERG LINDA K.;TRUONG HOA D. |
分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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