| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist material having excellent resolution and focal latitude and exhibiting little variation of line width and little shape distortion even when PED (post exposure delay) lasts over a long period of time. <P>SOLUTION: A photoacid generator for the chemically amplified positive resist material generates 2,4,6-triisopropylbenzenesulfonic acid and is represented by formula (1), wherein G and G' are each S or -CH=CH- with the proviso that both G and G' are not simultaneously S; a plurality of symbols R may be the same or different and are each H, F, Cl or a 1 to 4C linear, branched or cyclic substituted or unsubstituted alkyl or alkoxy; and k is an integer of 0 to 4. <P>COPYRIGHT: (C)2004,JPO |
