发明名称 METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO REACTOR
摘要 PROBLEM TO BE SOLVED: To prevent different gases from being mixed at the time of simultaneously radiating these gases. SOLUTION: A gas distribution system for a reactor having at least two distinct gas source orifice arrays displaced from one another along an axis defined by a gas flow direction from the gas source orifice arrays towards a work-piece deposition surface such that at least a lower one of the gas source orifice arrays is located between a higher one of the gas source orifice arrays and the work-piece deposition surface. Orifices in the higher one of the gas source orifice arrays may spaced an average of 0.2-0.8 times a distance between the higher one of the gas source orifice arrays and the work-piece deposition surface, while orifices in the lower one of the gas source orifice arrays may be spaced an average of 0.1-0.4 times a distance between the higher one of the gas source orifice arrays and the work-piece deposition surface. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007277723(A) 申请公布日期 2007.10.25
申请号 JP20070099449 申请日期 2007.04.05
申请人 GENUS INC 发明人 DALTON JEREMIE J;KARIM ZIAUL M;LONDERGAN ANA R
分类号 C23C16/455;H01L21/205 主分类号 C23C16/455
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