CHEMICALLY ADSORBABLE SUBSTANCE FOR THIN FILM FORMATION AND PROCESS FOR PRODUCING THE SAME

摘要

A thin film forming chemical adsorption material of the present invention includes at least a functional group expressed by the following chemical formula and a -SiX group (X represents halogen) as an end group bonded by siloxane bond. Consequently, a novel, thin-film forming, chemical adsorption material which is capable of forming a thin-film of a monomolecular layer form and has photosensitive groups which are transparent and stable in a visible light region and cause photochemical reaction in a ultraviolet light region, and the producing method thereof can be provided. The liquid crystal alignment film of the present invention includes an aggregation of adsorption molecules chemically adsorbed directly on a surface of a substrate with electrodes or chemically adsorbed indirectly thereon through another material layer, and further the adsorption molecules include adsorption molecule having a characteristic group expressed by the following chemical formula and a -O-Si bond group at a molecular end group. Consequently, the liquid crystal alignment film that is uniformly and strongly anchored on the substrate, is excellent in thermal stability of alignment as well as in controllability of alignment, and has a film thickness of such a level of nanometer as to be produced with good productivity, and the LCD using the same can be provided.