发明名称 COMPOSITION FOR FORMING INSULATING LAYER AND INSULATED FILM
摘要 PROBLEM TO BE SOLVED: To provide an insulating layer-forming composition to form an insulating layer excellent in insulation. SOLUTION: The insulating layer-forming composition is used to form an insulator layer of an electronic element and comprises at least one polymer selected from a polyamic acid and a derivative of the polyamic acid, and a compound having a functional group that can react with a carboxy group in a structural unit of the polymer. By using the insulating layer-forming composition of the present invention, for example, excellent insulation, the formation of an insulating layer with improved film strength, and low cost production of electronic elements can be realized. And the resultant electronic element can be used for an arithmetic device and a display device. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007270121(A) 申请公布日期 2007.10.18
申请号 JP20060319672 申请日期 2006.11.28
申请人 CHISSO CORP;CHISSO SEKIYU KAGAKU KK 发明人 KONDO FUMINAO;OOYANAI HIROKO
分类号 C08L79/08;C08L35/00;H01L21/312;H01L29/786 主分类号 C08L79/08
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