发明名称 STAGE EQUIPMENT AND METHOD OF CONTROLLING THE SAME, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce the influence of a driving-reaction force by effectively offsetting the driving-reaction force accompanying the driving of a stage. SOLUTION: The stage equipment comprises a surface plate, a stage which can move as a moving plane on the surface of the surface plate, and an adding mechanism for adding inertial force to the surface plate by using a mass body which moves in a direction perpendicular to the moving plane. The movement of the mass body in the direction perpendicular to the moving plane in the adding mechanism is so controlled as to reduce a force in a rotating direction on the axis parallel to the moving plane which is generated on the surface plate, when the stage moves on the moving plane, according to the movement of the stage. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007273633(A) 申请公布日期 2007.10.18
申请号 JP20060095850 申请日期 2006.03.30
申请人 CANON INC 发明人 ITO SATORU
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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