发明名称 |
Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium |
摘要 |
A lithography simulation method includes obtaining a mask transmission function from a mask layout, obtaining an optical image of the mask layout by using the mask transmission function, obtaining a function which is filtered by applying a predetermined function filter to the mask transmission function, and correcting the optical image by using the filtered function.
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申请公布号 |
US2007245292(A1) |
申请公布日期 |
2007.10.18 |
申请号 |
US20070783935 |
申请日期 |
2007.04.13 |
申请人 |
SATAKE MASAKI;TANAKA SATOSHI |
发明人 |
SATAKE MASAKI;TANAKA SATOSHI |
分类号 |
G06F17/50;G03F1/36;G03F1/68;H01L21/027 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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