发明名称 METHOD AND DEVICE FOR FORMING CONDUCTIVE PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a conductive pattern which can ensure ample electrical continuity, even if a resin substrate is employed. SOLUTION: A pattern is formed of a liquid with as micro particles of metal dispersed in a solvent on the surface of a substrate. The solvent is evaporated by making a light beam impinge on the pattern, while controlling so that the light beam will not be incident on a region where the pattern thus formed is not arranged. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007273533(A) 申请公布日期 2007.10.18
申请号 JP20060094400 申请日期 2006.03.30
申请人 SUMITOMO HEAVY IND LTD 发明人 KOBAYASHI KATSUYUKI
分类号 H05K3/10 主分类号 H05K3/10
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