METHOD FOR MANUFACTURING Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMATION OF MAGNETIC RECORDING FILM WHICH IS LESS LIKELY TO GENERATE PARTICLES, AND Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMATION OF MAGNETIC RECORDING FILM

摘要

A method for manufacturing a Co-base sintered alloy sputtering target for the formation of a magnetic recording film which is less likely to generate particles, characterized by comprising providing, as raw material powders, a Cr-Co alloy powder comprising 50 to 70 atomic% of Cr with the balance of Co, a Pt powder, a nonmagnetic oxide powder, and a Co powder, blending and mixing these raw material powders together so as to give a chemical composition comprising 2 to 15% by mole of a nonmagnetic oxide, 3 to 20% by mole of Cr, and 5 to 30% by mole of Pt with the balance consisting of Co, and sintering the mixture under pressure. A method for manufacturing a Co-base sintered alloy sputtering target for the formation of a magnetic recording film which is less likely to generate particles, comprising providing, as raw material powders, a Pt-Cr binary alloy powder comprising 10 to 90 atomic% of Pt with the balance consisting of Cr, a Pt powder, a nonmagnetic oxide powder, and a Co powder, blending and mixing these raw material powders so as to give a chemical composition comprising 2 to 15% by mole of the nonmagnetic oxide, 3 to 20% by mole of Cr, and 5 to 30% by mole of Pt with the balance consisting of Co, and then sintering the mixture under pressure. A method for manufacturing a Co-base sintered alloy sputtering target for the formation of a magnetic recording film, characterized by having a chemical composition comprising 2 to 15% by mole of a nonmagnetic oxide, 3 to 20% by mole of Cr, and 5 to 30% by mole of Pt with the balance consisting of Co and unavoidable impurities, the number of chromium oxide aggregates having an absolute maximum length of more than 5 µm in the base being not more than 500/mm<SUP>2</SUP>.