发明名称 Guardwall structures for ESD protection
摘要 A semiconductor circuit for protecting an I/O pad against ESD events comprising a pMOS transistor ( 510 ) in a first n-well ( 511 ) having its source connected to Vdd and the first n-well, and its drain connected to the I/O pad; the transistor has a finger-shaped contact ( 513 ) to the first n-well, which touches source junction 512 c. Source 512 has further an ohmic (silicided) connection to contact 513 . A finger-shaped diode ( 520 ) with its cathode ( 521 ) is located in a second n-well and connected to the I/O pad, and its anode connected to ground. The anode is positioned between the cathode and the first n-well, whereby the finger-shaped anode and cathode are oriented approximately perpendicular to the finger-shaped transistor n-well contact. Further a third finger-shaped n-well ( 551 ) positioned between the first n-well and the diode, the third n-well connected to power (Vdd) and approximately perpendicular to the first n-well contact, acting as a guard wall ( 550 ).
申请公布号 US7282767(B2) 申请公布日期 2007.10.16
申请号 US20050155062 申请日期 2005.06.17
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 DUVVURY CHARVAKA;BOSELLI GIANLUCA;KUNZ, JR. JOHN E.
分类号 H01L23/62 主分类号 H01L23/62
代理机构 代理人
主权项
地址