MEASUREMENT METHOD, MEASUREMENT SYSTEM, INSPECTION METHOD, INSPECTION SYSTEM, EXPOSURE METHOD, AND EXPOSURE SYSTEM

摘要

A reticle is loaded on a reticle measurement device (step S50) and a face shape of the reticle held on a reticle holder of the reticle measurement device is measured in advance (step S52). Since the face shape difference between the reticle holder of the reticle measurement device and the reticle holder of an exposure device is known, it is possible to calculate the face shape of the reticle in a state equivalent to the state when it is held by the reticle holder of the exposure device (step S56). The calculated face shape is used, for example, for correction of the image formation state upon exposure.