FABRICATION METHOD OF INTEGRATED OPTIC DEVICE

摘要

A method for fabricating an integrated optical device is provided to prevent reduction of an electric optical effect by grinding an upper plane of a lithium niobate substrate, and removing a pollution region and a substrate lattice defect. A method for fabricating an integrated optical device includes steps of: forming a mask key(114) on a bottom plane of a substrate; forming a quantum exchange diffusion prevention film on the substrate, and defining a region to be formed as an optical waveguide(106) by using the mask key(114); forming the optical waveguide(106) on the substrate, which is defined by the diffusion prevention film, by quantum exchange; removing the diffusion prevention film; grinding an upper plane of the substrate, and removing a lattice defect generated in the optical waveguide region; and forming an electrode around the optical waveguide(106) of the upper plane of the substrate by using the mask key(114).