| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus whose constitution for discharging atmosphere in a processing container can be downsized, and the atmosphere in the processing container can be evenly discharged. SOLUTION: Exhaust air from the processing container is led to a vapor-liquid separation container 50 through first to fourth exhaust pipes 41-44. The vapor-liquid separation container 50 is constructed by integrating a first exhaust assembly 51 which is arranged on an arranging plane 80 and is coupled to the first and second exhaust pipes 41 and 42, a second exhaust assembly 52 which is arranged on the arranging plane 80 and is coupled to the third and fourth exhaust pipes 43 and 44, and a third exhaust assembly 53 which is arranged between the first and second exhaust assemblies 51 and 52 on the arranging plane 80. A first partition for partitioning the first and third exhaust assemblies 51 and 53, and a second partition for partitioning the second and third exhaust assemblies 52 and 53, are formed in the vapor-liquid separation container 50. The pressure loss of an exhaust path from first to fourth exhaust air inlets 71-74 to an exhaust air outlet 102 is equal. COPYRIGHT: (C)2008,JPO&INPIT
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