| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask blank for defect evaluation, which is a positive resist-coated blank for electron bean exposure or the like, and with which evaluation of a defect performance in a resist material, a resist application process, a mask manufacturing process or the like can be inexpensively performed in a short time without preparing a transfer mask.SOLUTION: The mask blank for defect evaluation includes a thin film and a resist film comprising a positive resist on a major surface of a substrate. The resist film is entirely exposed by use of an exposure light source that can expose the resist. |
