| 发明名称 |
Device and method for the treatment of wafers |
| 摘要 |
A device and a method is provided for irradiating wafers with low-intensity UV light to prevent blistering during the subsequent photostabilization of the photoresist.
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| 申请公布号 |
US2007228004(A1) |
申请公布日期 |
2007.10.04 |
| 申请号 |
US20070730918 |
申请日期 |
2007.04.04 |
| 申请人 |
MOLKENTHIN JUERGEN-WERNER;OTTENLINGER DORIS |
发明人 |
MOLKENTHIN JUERGEN-WERNER;OTTENLINGER DORIS |
| 分类号 |
C03C25/68;C23F1/00 |
主分类号 |
C03C25/68 |
| 代理机构 |
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