| 摘要 |
In one embodiment of a manufacturing method of a transparent conductive film of the present invention, a grid having a magnet is placed between a target and a substrate, and a pattern shaped transparent conductive film comprising the target material is formed over the substrate through a mask by a sputtering method. In other embodiment of a manufacturing method of a transparent conductive film of the present invention, a mask is placed on a substrate, a pattern shaped transparent conductive layer comprising a target material is formed on the substrate by a sputtering method, and a trap electrode having a magnet pin is installed between the target and the substrate.
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