发明名称 PHOTOSENSITIVE COMPOSITION AND MATERIAL FOR FORMING LIGHT SHIELDING FILM FOR DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of solvent coating even if an aqueous dispersion of a pigment is used as a material, excellent in dispersion stability of the pigment, in properties of forming a pattern such as a black matrix (alkali developability and pattern profile), and in surface condition and solvent resistance of an obtained pattern, and having a high concentration as a black photosensitive material. <P>SOLUTION: The photosensitive composition comprises an alkali-soluble resin which is a copolymer containing an alkyl acrylate unit B of 30-90 mass% and having an acid number of &ge;50 mgKOH/g, an addition polymerizable monomer having an ethylenically unsaturated double bond, a photopolymerization initiator, an organic solvent miscible with water, water and the pigment. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007256684(A) 申请公布日期 2007.10.04
申请号 JP20060081772 申请日期 2006.03.23
申请人 FUJIFILM CORP 发明人 YOSHIMURA KOSAKU;MIYAKE KAZUHITO;SASAKI HIROKI
分类号 G03F7/033;G02B5/20;G03F7/004 主分类号 G03F7/033
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