CHARGED PARTICLE BEAM DRAWING SYSTEM, AND ADJUSTING METHOD OF CHARGED PARTICLE BEAM IRRADIATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam drawing system capable of adjusting an irradiation position in a short time. SOLUTION: The charged particle beam drawing system comprises: the charged particle beam irradiation device 90 provided with first and second deflectors 25a and 25b for deflecting charged particle beams so as to be transmitted through a plurality of pattern apertures and third and fourth deflectors 25c and 25d for deflecting them so as to be returned to a beam axis; a pattern selection deflection circuit 46 for impressing first-fourth deflection signals calculated from first-fourth signal ratios to the first-fourth deflectors; and a processing unit 54 for calculating the first-fourth reference deflection signals so as to irradiate the irradiation position through a reference pattern aperture and adjusting the first-fourth signal ratios from first adjustment deflection signals to be transmitted through an adjustment pattern aperture, second adjustment deflection signals to be transmitted through the reference pattern aperture, third adjustment deflection signals to be transmitted through the adjustment pattern aperture and deflected to the irradiation position and fourth adjustment deflection signals to be transmitted through the adjustment pattern aperture and deflected to the irradiation position. COPYRIGHT: (C)2008,JPO&INPIT