| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a novel method of processing an electron emission electrode and a structure of electron sources for achieving the same. <P>SOLUTION: Insulating barrier ribs are formed in the same layer as and in parallel with power-feeding electrodes feeding power to electron emission electrodes, the electron emission electrodes are formed into films on the whole surface of an image display region, and the electron emission electrodes are cut off by breaking at side faces of the barrier ribs, condensation and solid solution diffusion through heat treatment, ablation by laser irradiation on top faces of Si barrier ribs, and Joule-heat fusion by applying an electric current between scanning lines pinching the Si barrier ribs. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
