发明名称 NONTHERMAL PLASMA PROCESSOR UTILIZING ADDITIVE-GAS INJECTION AND/OR GAS EXTRACTION
摘要 A device (10) for processing gases includes a cylindrical housing (12) in which an electrically grounded, metal injection/extraction gas supply tube (26) is disposed. A dielectric tube (24) surrounds the injection/extraction gas supply tube (26) to establish a gas modification passage (30) therearound. Additionally, a metal high voltage electrode (22) circumscribes the dielectric tube (24). The high voltage electrode (22) is enegizable to create nonthermal electrical microdischarges between the high voltage electrode (22) and the injection/extraction gas supply tube (26) across the dielectric tube (24) within the gas modification passage (30). An injection /extraction gas and a process gas flow through the nonthermal electrical microdischarges within the gas modification passage (30) and a modified process gas results. Using the device contaminants that are entrained in the process gas ca be destroyed to yield a cleaner, modified process gas.
申请公布号 WO2004085693(A3) 申请公布日期 2007.09.07
申请号 WO2004US07160 申请日期 2004.03.09
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 ROSOCHA, LOUIS, A
分类号 B01J19/08;B01D53/32;H01J37/32 主分类号 B01J19/08
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