| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a phase metrology pattern for an attenuating phase mask. <P>SOLUTION: The phase error of this pattern can be determined to high accuracy by aerial image measurements. This pattern can be used to create an optical phase standard for calibrating phase metrology equipment for attenuated phase masks or as a witness pattern on a product mask, to verify the phase accuracy of that mask. The pattern includes an effective line to space ratio and can be tested, by using a microscope or a stepper system, or can be measured directly using a detector for the zeroth-order diffraction measurement. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
