发明名称 |
POLYMER RESIN COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME AND METHOD OF MANUFACTURING A CAPACITOR USING THE SAME |
摘要 |
Provided are a polymer resin composition, a method for forming a blocking pattern by using the composition to inhibit the generation of void at an aperture and to prevent the separation or removal of a lower electrode, and a method for forming a capacitor lower electrode by using the composition. A polymer resin composition comprises 75-93 wt% of a copolymer which comprises a benzyl methacrylate monomer, a methacrylic acid monomer and a hydroxyethyl methacrylate monomer; 1-7 wt% of a crosslinking agent; 0.01-0.5 wt% of a thermal acid generator; 0.01-1 wt% of a photoacid generator; 0.00001-0.001 wt% of an organic base; and the balance of a solvent. Preferably the crosslinking agent is a melamine-based resin; and the thermal acid generator comprises at least one compound represented by formulae 1, 2, 3, 4 and 5.
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申请公布号 |
KR100753542(B1) |
申请公布日期 |
2007.08.23 |
申请号 |
KR20060035205 |
申请日期 |
2006.04.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG, KYONG RIM;AHN, SUN YUL;KIM, YOUNG HO;KIM, JAE HYUN;YANG, JOO HYUNG;KIM, TAE SUNG |
分类号 |
C08L33/12;C08L33/14 |
主分类号 |
C08L33/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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