| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetron sputtering system for depositing a thin film on a base material of an optical storage medium which is capable of preventing electrons escaping from plasma from being incident on the base material. SOLUTION: In the magnetron sputtering system for depositing a thin film on a base material 1 of an optical storage medium, an electron trap center magnet 3 is placed on the line passing through a center of a target 5 and a center of the optical storage medium, and in the middle between the target 5 and the optical storage medium or on a back side of the optical storage medium. An electron trap peripheral magnet 4 is located inside or outside the outer circumferential line of the outer circumference of the target 5 or on the outer circumferential line, and placed in the middle between the target and the optical storage medium. COPYRIGHT: (C)2007,JPO&INPIT
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