发明名称 |
Capacitance dielectric layer, capacitor and forming method thereof |
摘要 |
A capacitance dielectric layer is provided. The capacitance dielectric layer includes a first dielectric layer, a second dielectric layer and a silicon nitride stacked layer. The silicon nitride stacked layer is disposed between the first dielectric layer and the second dielectric layer. The structure of the capacitance dielectric layer permits an increase in the capacitance per unit area by decreasing the thickness of the capacitance dielectric layer and eliminates the problems of having a raised leakage current and a diminished breakdown voltage.
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申请公布号 |
US2007196977(A1) |
申请公布日期 |
2007.08.23 |
申请号 |
US20060358972 |
申请日期 |
2006.02.21 |
申请人 |
WANG CHIH-CHUN;CHEN HSIN-HSING;CHIANG YU-HO |
发明人 |
WANG CHIH-CHUN;CHEN HSIN-HSING;CHIANG YU-HO |
分类号 |
H01L21/8244 |
主分类号 |
H01L21/8244 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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