发明名称 COMPOSITION FOR POLISHING
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a composition for polishing having excellent polishing performance and long shelf life. <P>SOLUTION: The composition for polishing contains (a) colloidal silica of which a part of surface is covered with aluminum atoms, and (b) a compound having at least one kind of isothiazoline-3-on skeleton. The compound having isothiazoline-3-on skeleton is 2-methyl-4-isothiazoline-3-on. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007214270(A) 申请公布日期 2007.08.23
申请号 JP20060031243 申请日期 2006.02.08
申请人 FUJIFILM CORP 发明人 KATO TOMOO
分类号 H01L21/304;B24B37/00;C09K3/14 主分类号 H01L21/304
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