发明名称 |
Method for manufacturing site-selectively modified micro-and nanostructures |
摘要 |
<p>It is an object of the present invention to provide a method which can easily and selectively modify specific sites on indentations or protrusions of indentation/protrusion structures fabricated by nanoimprinting. Pressing a mold having indentation/protrusion structures onto a polymer substrate comprising at least two layers of different chemical composition exposes the second layer, which has been covered by the outermost layer, in pillars formed as a result of the pressing. Site-specific chemical modification of the pillars can be achieved by formulating a desired chemical composition for the second layer beforehand, or by chemical modification of the exposed second layer cross-sections in the pillars.</p> |
申请公布号 |
EP1820773(A2) |
申请公布日期 |
2007.08.22 |
申请号 |
EP20070001038 |
申请日期 |
2007.01.18 |
申请人 |
HITACHI, LTD. |
发明人 |
MURAO, KENJI;KUWABARA, KOSUKE;OGINO, MASAHIKO |
分类号 |
B81C1/00;B29C43/02;B82Y10/00;B82Y15/00;B82Y40/00;G03F7/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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