| 摘要 |
<p>A lithography apparatus and a device manufacturing method are provided to apply a large clamping force without the deformation of a patterning device by using an improved holder structure composed of a first and a second holders arranged at both sides of the patterning device. A lithography apparatus includes a support body, a projection system, a first holder and a second holder. The support body supports a patterning device which is capable of endowing a cross-section of a radiation beam with a predetermined pattern. The projection system(PS) is used for projecting the patterned radiation beam onto a target portion of a substrate. The first holder keeps the patterning device on a first surface of the patterning device. A second holder retains the patterning device on a second surface of the patterning device. A vacuum clamp is used as the first and the second holders.</p> |
