发明名称 Methods for forming semiconductor wires and resulting devices
摘要 Methods for forming a wire from silicon or other semiconductor material are disclosed. Also disclosed are various devices including such a semiconductor wire. According to one embodiment, a wire is spaced apart from an underlying substrate, and the wire extends between a first end and an opposing second end, each of the first and second ends being affixed to the substrate. Other embodiments are described and claimed.
申请公布号 US2007187731(A1) 申请公布日期 2007.08.16
申请号 US20070651681 申请日期 2007.01.09
申请人 INTEL CORPORATION 发明人 CHANG PETER L.
分类号 H01L29/76;H01L21/336;H01L21/82;H01L21/8234;H01L29/423;H01L29/786 主分类号 H01L29/76
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