发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE WITH PROTECTION LAYER
摘要 A method for manufacturing a semiconductor device may comprise preparing a wafer having a front surface and a back surface. The wafer may have a plurality of semiconductor chips and scribe lines between the adjacent semiconductor chips. The wafer may be sawn along the scribe lines to form grooves between the adjacent semiconductor chips. A liquid protection material may be screen printed or spin-coated to form a protection layer on the back surface and within the grooves. The protection layer within the grooves may be more narrowly cut to form individual semiconductor devices and to leave a protection layer remaining thereon.
申请公布号 US2007190688(A1) 申请公布日期 2007.08.16
申请号 US20060565901 申请日期 2006.12.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOUN HAN-SHIN;MOK SEUNG-KON;JUNG YOUNG-DOO
分类号 H01L21/00 主分类号 H01L21/00
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