| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of preventing a minute quantity of dust from adhering to an electrostatic lens being an object lens, and of applying a high voltage to the electrostatic lens. SOLUTION: This charged particle beam device 1 is provided with: a chamber 2 capable of evacuating the inside 2a thereof by an in-chamber evacuation means 4; and a lens barrel 3 for irradiating a sample S arranged in the inside 2a of the chamber 2 with a charged particle beam B1. The lens barrel 3 is provided with: a cylindrical body 5 with an irradiation opening 6 for emitting the charged particle beam B1 formed therein; a charged particle beam supply part 7 housed on the side of a base end 5c in the inside 5b of the cylindrical body 5 for emitting the charged particle beam B1; and an object lens 11 housed on the side of a tip 5a of the inside 5b of the cylindrical body 5, and having the electrostatic lens for generating an electric field to focus the charged particle beam B1 emitted from the charged particle beam supply part 7. In the cylindrical body 5 of the lens barrel 3, a gas supply means 12 capable of supplying gas G to the inside 5b of the cylindrical body 5 is arranged on the base end side of the object lens 11. COPYRIGHT: (C)2007,JPO&INPIT
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