发明名称 MASK FILM FORMATION METHOD AND MASK FILM FORMATION APPARATUS
摘要 A substrate and a mask are closely adhered to each other with a high alignment accuracy. While the both ends of the substrate are sandwiched between a substrate supporting member and a planar member, the center portion of the substrate is bent in a convex fashion by means of a substrate pressing member. On a mask pedestal, the mask is also bent in a convex fashion with respect to the substrate by means of a mask pressing member. After alignment in the plane direction between the mask and the substrate is performed, the mask and the substrate are made to approach each other and the convex portion is closely adhered to each other at an initial stage, and then the respective whole surfaces of the mask and the substrate are closely adhered to each other, while the substrate pressing member and the mask pressing member are moved backward. The mask pressing member may be omitted.
申请公布号 US2007184195(A1) 申请公布日期 2007.08.09
申请号 US20070624305 申请日期 2007.01.18
申请人 CANON KABUSHIKI KAISHA 发明人 HATAKEYAMA HIDEYUKI;YABU SHUICHI
分类号 B05D1/32;C23C16/00 主分类号 B05D1/32
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