发明名称 |
Liquid immersion lithography system with tilted liquid flow |
摘要 |
A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.
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申请公布号 |
US7253879(B2) |
申请公布日期 |
2007.08.07 |
申请号 |
US20060586639 |
申请日期 |
2006.10.26 |
申请人 |
ASML HOLDING N.V. |
发明人 |
KHMELICHEK ALEKSANDR;MARKOYA LOUIS;SEWELL HARRY |
分类号 |
G03B27/42;G03B27/32;G03B27/52 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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