发明名称 |
METHODS AND APPARATUS FOR DRYING A SUBSTRATE |
摘要 |
In a first aspect, a method of drying at least a portion of a substrate located within a fluid is provided. The method includes contacting an edge of the substrate that is located within the fluid with a pusher pin. The pusher pin has (a) a shaft portion; and (b) a tip portion having a knife edge of a width of 0.42 inches or less, the tip portion adapted to contact and support the substrate with the knife edge. The method further includes lifting the substrate from the fluid with the pusher pin; and exposing the substrate to a drying vapor as the substrate is lifted from the fluid. Numerous other aspects are provided.
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申请公布号 |
WO2007047163(A3) |
申请公布日期 |
2007.08.02 |
申请号 |
WO2006US39172 |
申请日期 |
2006.10.03 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ETTINGER, GARY, C.;KHAU, MICHAEL, E.;SHIN, HO, SEON |
分类号 |
H05K5/00;H05K7/20 |
主分类号 |
H05K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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