| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin-film transistor having an oxide semiconductor thin-film layer composed of zinc oxide as the main component, wherein the conductivity of the oxide semiconductor thin-film layer is controlled by controlling hydrogen concentration within the oxide semiconductor thin-film layer that forms a channel of the thin-film transistor to effect leakage current suppression, threshold voltage reduction, and electron mobility increase. <P>SOLUTION: The thin-film transistor comprises an oxide semiconductor thin-film layer composed of zinc oxide as the main component, deposited on a substrate, and forming a channel; a gate insulating film; and a gate electrode at least, wherein hydrogen is contained at least in the oxide semiconductor thin-film layer. <P>COPYRIGHT: (C)2007,JPO&INPIT |
