发明名称 METHOD AND DEVICE FOR ANALYZING STRESS/DISTORTION
摘要 PROBLEM TO BE SOLVED: To provide a method and device for analyzing stresses, allowing more detailed stress measurement exceeding beyond the limit of the principle of photoelasticimetry. SOLUTION: In measuring the stress state of an object, by using not only the photoelasticimetry but also the stress measurement (stress luminescence measurement) by using a stress luminescent material, component valuesσ<SB>1</SB>andσ<SB>2</SB>of main stress, for example, can be known beyond the principled limit of the photoelasticimetry, and detailed stress measurement is allowed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007192689(A) 申请公布日期 2007.08.02
申请号 JP20060011844 申请日期 2006.01.20
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 HYODO TAKASHI;XU CHAO-NAN;YAMANE TAKASHI;AKAMATSU MIKIYUKI;YOKOGAWA YOSHIYUKI;KAMEYAMA TETSUYA
分类号 G01L1/00 主分类号 G01L1/00
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