发明名称 |
Mask having balance pattern and method of patterning photoresist using the same |
摘要 |
A method and mask having balance patterns for reducing and/or preventing chemical flare from occurring in a photoresist between a first mask region and a second mask region. Balance patterns formed on the mask may have a desired and/or predetermined pitch and may be regularly arranged. If the pitch of the balance patterns is equal to or smaller than a threshold value, the balance patterns may not allow the patterns to be transferred onto a photoresist. In addition, the photoresist corresponding to the balance patterns may be either completely removed or completely remain depending on the duty of the balance patterns.
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申请公布号 |
US2007178391(A1) |
申请公布日期 |
2007.08.02 |
申请号 |
US20060525965 |
申请日期 |
2006.09.25 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM TAE-YOUNG;KIM SANG-JIN;KOH CHA-WON;JUNG SUNG-GON;JUNG MYOUNG-HO;LEE YOUNG-MI |
分类号 |
G03C5/00;G03F1/00;G03F9/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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