| 摘要 |
PROBLEM TO BE SOLVED: To maintain flatness of a peripheral embedded insulating film without reducing reflectance of a reflection electrode in a step for removing a protective film in a manufacturing method of a semiconductor device and in a manufacturing method of a reflection type liquid crystal display. SOLUTION: After a flattening insulating film 8 is embedded in a peripheral part of a structural body 5 comprising an uppermost layer wiring 6 and the amorphous carbon protective film 7 provided thereon and serving as a reflection preventing film and flattened, the amorphous carbon protective film 7 is removed. COPYRIGHT: (C)2007,JPO&INPIT |
