MASK AND METHOD FOR MANUFACTURING DISPLAY SUBSTRATE USING THE MASK

摘要

A mask and a method for manufacturing a display substrate using the same are provided to secure stepped portions of a photoresist pattern corresponding to a light shielding pattern and a semi-transmitting region and to extend a planarization region of the photoresist pattern corresponding to the semi-transmitting region by acquiring uniform exposure rates from center and end portions of the semi-transmitting region using an opening pattern of the semi-transmitting region adjacent to the light shielding pattern. A mask includes a transparent substrate(10), a light shielding layer, and a semi-transmitting region. The light shielding layer(20) is formed on the transparent substrate. The light shielding layer includes a light shielding pattern(22) and a first opening pattern(24) with a first width. The semi-transmitting region(30) is formed in the first opening pattern. A second opening pattern(32) is formed on the semi-transmitting region. The second opening pattern has a second width smaller than the first width of the first opening pattern. The second opening pattern is formed at a portion adjacent to the light shielding pattern.